Zinc oxide antireflection thin-film: spin coater parameters effects

dc.contributor.authorGuernazi, D.
dc.contributor.authorKail, F.
dc.contributor.authorGrabulosa, P. Roura
dc.contributor.authorMourad, L.
dc.contributor.authorChahed, L.
dc.date.accessioned2023-09-06T07:12:13Z
dc.date.available2023-09-06T07:12:13Z
dc.date.issued2021
dc.description.abstractZinc oxide (ZnO) is one of the commonly used materials in antireflective coating (ARC) due to its optical, physical, and chemical properties. In order to enhance optical transmittance, an ARC is essential. Refractive index and film thickness are the key parameters to get an efficient ARC. The aim of this work is to study deposition parameters’ effects on thickness evolution and film quality. Spin-coated ZnO film thickness was measured and controlled according to revolutions per minute (rpm) and spin time (t). For this purpose, a sol-gel derived film containing dihydrate Zinc Acetate (ZAD) and ethanolamine was used to be spin-coated on a glass substrate. Thermogravimetric analysis (TGA) was carried out in order to study the film thermal behavior and was followed by X-Ray Diffraction (XRD) measurement in order to confirm the crystallization of ZnO. The film thickness was deduced from its mass measured by a microbalance and its’ centrifugal spread over the substrate was checked by an optical microscope. By optimizing the deposition parameters, good film spread was obtained up to 4000 rpm with a spin time of 90 seconds at least. We found that the rpm affects strongly film thickness, in contrast to the spin time which affects the film spread.ar
dc.identifier.issn2170-161X
dc.identifier.issn2588-2082
dc.identifier.urihttp://hdl.handle.net/123456789/15082
dc.language.isoenar
dc.publisherOum-El-Bouaghi Universityar
dc.subjectAntireflective coatingar
dc.subjectZinc oxidear
dc.subjectSpin coatingar
dc.subjectFilm thicknessar
dc.subjectSpin timear
dc.titleZinc oxide antireflection thin-film: spin coater parameters effectsar
dc.typeArticlear
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