The effectofgrowthconditions,pointdefectsandhydrogen on theelectronicstructureandpropertiesofp-type(Al,N) codopedZnO
dc.date.accessioned | 2022-04-28T02:59:30Z | |
dc.date.available | 2022-04-28T02:59:30Z | |
dc.date.issued | 2015 | |
dc.description.abstract | The effectsofpointdefects,hydrogen,andgrowthconditionsontheelectronicstructure and propertiesofthe(Al,N)codopedp-typeZnOhavebeeninvestigatedusingthefirst principlesmethod.TheobtainedresultsshowedthattheAlZn–NO–VZn complexisa shallowacceptorthatcanplayanimportantroleinachievingthep-typeconductivityin the (Al,N)codopedZnOfilms.Ourresultsshowedalsothattheelectricalconductivitytype in the(Al,N)codopedZnOfilmsstronglydependsonthedonor/acceptorconcentrations ratio. ThecodopedZnOfilmspreparedunderbothZn-richandO-richgrowthconditions withadonors/acceptorsratioof1:2haveap-typeconductivity,whilethosepreparedwith a ratioof1:1cannotbep-typeunlessiftheyarepreparedunderO-richconditions.The achievedp-typequalitydependsalsoontheusednitrogendopingsource.Toprepare p-typeZnOfilmofhighqualityusingthe(Al,N)codopingmethod,theuseofNOorNO2 is recommended.Thepresenceofdonordefectssuchasoxygenvacanciesandhydrogenwill significantlyaffecttheelectronicpropertiesofthe(Al,N)codopedZnOfilms,andifthe concentrationofthesedefectsinthesampleishighenough,thematerialcanbeeasily convertedton-type. | ar |
dc.identifier.issn | 148–155 | |
dc.identifier.uri | http://hdl.handle.net/123456789/13061 | |
dc.language.iso | en | ar |
dc.publisher | Elsevier | ar |
dc.subject | ZnO | ar |
dc.subject | Hydrogen | ar |
dc.subject | First-principles | ar |
dc.subject | p-Type | ar |
dc.subject | Vacancy | ar |
dc.title | The effectofgrowthconditions,pointdefectsandhydrogen on theelectronicstructureandpropertiesofp-type(Al,N) codopedZnO | ar |
dc.title.alternative | A firstprinciplesstudy | ar |
dc.type | Article | ar |
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