Numerical study and performance analysis of carbone nanotube field effect transistors

dc.contributor.authorRechem, Djamil
dc.contributor.authorBenkara, Salima
dc.contributor.authorLamamra, Kheireddine
dc.date.accessioned2022-04-27T05:24:23Z
dc.date.available2022-04-27T05:24:23Z
dc.date.issued2013
dc.description.abstractAs transistors are scaled down to nanometers, the theory and structure of nanometers devices such as carbon nanotubes field effect transistors (CNTFET) are being extensively studied. Self consistent solution of the Poisson and Schrödinger equations is performed using the nonequilibrium Green’s function (NEGF) formalism to investigate the impact of nanotube diameter, gate oxide thickness and high-k gate dielectric permittivity parameters on the coaxially gate, n-type CNTFET. Our results show that the nanotube diameter and gate oxide thickness influences the ION/IOFF current ratio, the drain induced barrier lowering (DIBL), the subthreshold slop as well as transconductance and drain conductance. Furthermore, in this work we focus on the impact of high-k gate dielectric permittivity on the performance of CNTFETs. Using high-k dielectric is caused by the enhancement in device characteristics. A good agreement with numerical simulation results is obtained.ar
dc.identifier.urihttp://hdl.handle.net/123456789/13024
dc.language.isoenar
dc.publisherOpatija, Croatiaar
dc.titleNumerical study and performance analysis of carbone nanotube field effect transistorsar
dc.typeArticlear
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