Structural And Magnetic Properties Of Electrodeposited Nife Alloy On Silicon Nanowires.

dc.contributor.authorLamrani, S .
dc.contributor.authorGuittoum, A.
dc.contributor.authorHadjersi, T.
dc.contributor.authorBouanik, S.
dc.contributor.authorMebarki, M.
dc.contributor.authorBenbrahim, N.
dc.date.accessioned2023-09-18T09:05:59Z
dc.date.available2023-09-18T09:05:59Z
dc.date.issued2014
dc.description.abstractPerpendicular Silicon nanowires (SiNWs), having 20 micrometer in length, were fabricated by metal assisted chemical etching of n-type Si(100) wafers in aqueous HF-solution. In a second step, NiFe films were electrodeposited onto theses SiNWs. The structure and magnetic properties of as deposited NiFe layers were studied by X ray diffraction (XRD) and vibrating sample magnetometer (VSM). From X-ray diffraction, the FCC NiFe structure was evidenced with a lattice constant, a, equal to 3.5270 Å. From hysteresis curves, we compute the coercive field, Hc, values. We found that the Hc // values range from 102 Oe to 236 Oe.ar
dc.identifier.issn2170-161X
dc.identifier.urihttp://hdl.handle.net/123456789/16075
dc.publisherOum-El-Bouaghi Universityar
dc.subjectSilicon nanowiresar
dc.subjectMagnetic propertiesar
dc.subjectNiFe layerar
dc.titleStructural And Magnetic Properties Of Electrodeposited Nife Alloy On Silicon Nanowires.ar
dc.typeArticlear
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