Influence of temperature and pressure on the atoms ejected path during thin films deposition

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dc.contributor.authorRefas, S.C.
dc.contributor.authorBouazza, A.
dc.contributor.authorBelhadji, Y.
dc.contributor.authorOthmani, R.
dc.date.accessioned2025-04-21T22:47:24Z
dc.date.available2025-04-21T22:47:24Z
dc.date.issued2021
dc.description.abstractThe simulation with Monte-Carlo codes represented the efficiency tools which helps knowing the phenomena that occur inside the vacuum hamber for sputtering process. In this work, the impact of temperature and pressure parameters on the surface structure of thin films are studied in 3D form with the magnetron sputtering technique. Inside a vacuum chamber a 105 particles of Argon (Ar) gas are injected, the target contained the semiconductor silicon (Si), and the substrate is placed with a variable distance from the target .The results obtained in this work show that a high temperature, pressure and a long distance between the target and substrate can negatively affects the path of the atoms ejected away from the target which will cause a decrease in the number of atom arriving on the substrate.
dc.identifier.urihttp://dspace.univ-oeb.dz:4000/handle/123456789/21979
dc.language.isoen
dc.publisherUniversity of Oum El Bouaghi
dc.subjectThin films; Sputtering; Vacuum chamber; Monte Carlo codes
dc.titleInfluence of temperature and pressure on the atoms ejected path during thin films deposition
dc.typeArticle
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The 1 ST international conference on electronics, artificial intelligence and technologies ICEAINT 2021