Influence of temperature and pressure on the atoms ejected path during thin films deposition
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Date
2021
Journal Title
Journal ISSN
Volume Title
Publisher
University of Oum El Bouaghi
Abstract
The simulation with Monte-Carlo codes represented the efficiency tools which helps knowing the phenomena that occur inside the vacuum hamber for sputtering process. In this work, the impact of temperature and pressure parameters on the surface structure of thin films are studied in 3D form with the magnetron sputtering technique. Inside a vacuum chamber a 105 particles of Argon (Ar) gas are injected, the target contained the semiconductor silicon (Si), and the substrate is placed with a variable distance from the target .The results obtained in this work show that a high temperature, pressure and a long distance between the target and substrate can negatively affects the path of the atoms ejected away from the target
which will cause a decrease in the number of atom arriving on the substrate.
Description
Keywords
Thin films; Sputtering; Vacuum chamber; Monte Carlo codes