Incorporation of CdS nanoparticles on mesoporous silicon substrate as application for detection systems

dc.contributor.authorSaker, Fatima
dc.contributor.authorRemache, Louardi
dc.contributor.authorRahmani, Abdellah
dc.date.accessioned2025-04-17T22:16:58Z
dc.date.available2025-04-17T22:16:58Z
dc.date.issued2021
dc.description.abstractin this study CdS nanoparticles were successfully deposited by chemical bath depo-sition (CBD) on the porous silicon (Psi) and glass substrates. In order to prepare por-ous silicon, an electrochemical etching method was carried out using p-type Si (100) at various current densities with fixed time (5 min). Crystallographic structure of pre-pared samples was analyzed with X-ray diffraction (XRD), The surface morphology of films was obtained by scanning electron microscopy (SEM). Results demonstrated that the morphology of the deposited materials was influenced by the porosityof the PSi substrate. The crystallite size determined by the Debye- Scherrer equation and the smallest value was 13.96 nm from CdS/PSi anodized using the current density of 60 mA/cm2.SEM results confirms the shows the porous CdS thin films morphology. The optical properties of nanostructure CdS thin films were obtained by using UV-visible. TheCdS shows a band gap(Eg=2.3 eV)valueobtained by transmittances-pectrum. The high surface area of CdS/PSi structures could be helpful for making highly sensitive photodetectors.
dc.identifier.urihttp://dspace.univ-oeb.dz:4000/handle/123456789/21896
dc.language.isoen
dc.publisherUniversity of Oum El Bouaghi
dc.subjectPorous silicon(PSi); CdS,nanoparticles; Photodetector
dc.titleIncorporation of CdS nanoparticles on mesoporous silicon substrate as application for detection systems
dc.typeArticle
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