Effects of boron diffusion on titanium silicide formation
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Date
2021
Journal Title
Journal ISSN
Volume Title
Publisher
University of Oum El Bouaghi
Abstract
Secondary ion mass spectrometry (SIMS) has been used to investigate Boron diffusion in Titanium silicide layers for several annealing conditions of duration and temperature. Experimental profiles were simulated using a model based on the famous Fick’s laws and the effect accompanying boron diffusion during silicidation like segregation and clustering. The comparison between simulation results and those of the literature in the same
annealing conditions shows a good agreement between our results and those of other works. This explains that boron diffusion in titanium silicide depends on segregation, clustering and the solid solubility exceeds.
Description
Keywords
SIMS; Titanium Silicide; Boron; Simulation; Diffusion