Browsing by Author "Saidani, T."

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    Effect of copper doping on the photocatalytic activity of ZnO thin films prepared by solegel method
    (Elsevier, 2015) Saidani, T.; Zaabat, M.; Aida, M.S.; Boudine, B.
    In the present work, we prepared undoped and copper doped ZnO thin films by the sol egel dip coating method on glass substrates from zinc acetate dissolved in a solution of ethanol. The objective of our work is to study the effect of Cu doping with different concentrations on structural, morphological, optical properties and photocatalytic activity of ZnO thin films. For this purpose, we have used XRD to study the structural properties, and AFM to determine the morphology of the surface of the ZnO thin films. The optical properties and the photocatalytic degradation of the films were examined by UVevisibles spectrophotometer. The Tauc method was used to estimate the optical band gap. The XRD spectra indicated that the films have an hexagonal wurtzite structure, which gradually deteriorated with increasing Cu concentration. The results showed that the incorporation of Cu decreases the crystallite size. The AFM study showed that an increase of the concentration of Cu causes the decrease of the surface roughness, which passes from 20.2 for Un-doped ZnO to 12.16 nm for doped ZnO 5 wt% Cu. Optical measurements have shown that all the deposited films show good optical transmittance (77%e92%) in the visible region and increases the optical gap with increasing Cu concentration. The presence of copper from 1% to 5 wt% in the ZnO thin films is found to decelerate the photocatalytic process.
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    Morphological And Optical Properties Of Sol-gel Derived Ni Doped Zno Thin Film
    (Oum-El-Bouaghi University, 2014) Saidani, T.; Zaabat, M.; Benaboud, A.; Boudine, A.
    In this work, we are interested in thin films of zinc oxide doped with nickel (Ni), deposited on glass substrates and elaborated by the sol-gel dip coating technique. The effects of the doping concentration in the range of ​​outlet (1%, 3% and 5at%) have been thoroughly studied. The morphological properties of ZnO-Ni films were studied by Atomic Force Microscopy (AFM). The optical properties of the ZnO:Ni thin films were examined by UV-visible spectroscopy and the Tauc method was used to estimate the optical band gap and hall effect for electrical characteristique. Atomic Force Microscopy has indicated that the surface of the ZnO:Ni thin films have uniform and dense ZnO grains. The optical transmittance of ZnO:Ni thin films increased from 86 to about 93% from pure ZnO films to ZnO film doped with 3 wt% Ni and then decreased for 5 wt% Ni, and the optical band gap from 3.297 eV to 3.23eV. The electrical characterization performed using the technique of hall effect, gave a maximum electrical conductivity of 9.3 10-3(Ω.Cm)-1 obtained for the film doped with 3%Ni.